Stress anisotropy and stress gradient in magnetron sputtered films with different deposition geometries

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 24, Issue 2, 2006, Pages 195-201

  Zhao, Z B ^a   Yalisove, S M ^b   Bilello, J C ^b  

^a DELPHI CORPORATION   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BIAXIAL STRESS; STRESS ANISOTROPY; STRESS GRADIENT;

ANISOTROPY; MAGNETRON SPUTTERING; MICROSTRUCTURE; MOLYBDENUM; RESIDUAL STRESSES; STRESS ANALYSIS;

THIN FILMS;

EID: 33644503228     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.2150230     Document Type: Article

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