Evolution of anisotropic microstructure and residual stress in sputtered Cr films

Journal of Applied Physics

Volumn 92, Issue 12, 2002, Pages 7183-7192

  Zhao, Zhibo B ^a   Yalisove, S M ^b   Rek, Z U ^c   Bilello, J C ^b  

^a DELPHI CORPORATION   (United States)

^b UNIVERSITY OF MICHIGAN   (United States)

^c SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; CHROMIUM; MICROSTRUCTURE; SPUTTERING; STRESS ANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY SCATTERING;

ANISOTROPIC MICROSTRUCTURES;

METALLIC FILMS;

EID: 0037115439     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1521791     Document Type: Article

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