Surface roughness and in-plane texturing in sputtered thin films

Journal of Applied Physics

Volumn 84, Issue 3, 1998, Pages 1346-1353

  Whitacre, J F ^a   Rek, Z U ^b   Bilello, J C ^a   Yalisove, S M ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

^b SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001081897     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.368204     Document Type: Article

References (17)

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11. This sample was used as a standard for all AFM work done. The fact that the facet tops appear rounded (as compared to the cross-section TEM) shows that the resolution of the AFM was limited due to imperfection of the probe tip.
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