Optical, structural, and mechanical properties of gadolinium tri-fluoride thin films grown on amorphous substrates

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5963, Issue , 2005, Pages

  Thielsch, Roland ^a   Heber, Joerg ^b   Uhlig, Hein ^c   Kaiser, Norbert ^c  

^a Southwall Europe GmbH   (Germany)

^b FRAUNHOFER INSTITUTE FOR PHOTONIC MICROSYSTEMS   (Germany)

^c FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Fluoride; GdF3; Mechanical stress; Optical properties; Structural properties; UV coating

Indexed keywords

EXCIMER LASERS; GADOLINIUM COMPOUNDS; LANTHANUM COMPOUNDS; OPTICAL PROPERTIES; ULTRAVIOLET SPECTROSCOPY;

FLUORIDE; GDF3; MECHANICAL STRESS;

THIN FILMS;

EID: 33144486709     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.625096     Document Type: Conference Paper

References (19)

1. H. Nishioka; T. Kawasumi; K. Ueda; H. Takuma, "Measurement of multi-photon absorption and electron avalanche in UV optical thin films", Review of Laser Engineering, Vol: 20 Iss: 5 p. 344-54, 1992
2. D. Raiser; J.P. Deville, "Study of XPS photoemission of some gadolinium compounds", Journal of Electron Spectroscopy and Related Phenomena, Vol: 57 Iss: 1 p. 91-7, 1991
3. R. Conwell, "Investigation of fluoride thin-films for reflective coatings at 157nm", SPIE Vol.3268 (1998) p.351-6
4. L. J. Lingg, "Lanthanide trifluoride thin films: structure, composition, and optical properties", Dissertation, University of Arizona, 1990
5. J. Kolbe, M. Muller, H. Schink, H. Welling, J. Ebert, "Laser induced damage thresholds of dielectric coatings at 193nm and correlations to optical constants and process parameters", NIST Spec. Publ. 801(1990) p.404-16
6. J. Kolbe, "Entwicklung verlustarmer und strahlungsresistenter dielektrischer Spiegel für den VUV-Bereich" PhD thesis, Universität Hannover, 1991 (Germany)
7. J. Heber, A. Gatto, N. Kaiser, "Spectrophotometry in the vacuum UV", Proc. SPIE Vol. 4932 (2002), 544-548
8. R. Thielsch, J. Heber, S. Jakobs, N. Kaiser, A. Duparre, "Optical, structural and mechanical properties of lanthanide trifluoride thin film materials for use in the DUV-spectral region", OSA Technical Digest Series "Optical Interference Coatings" Vol.9, p.TuA7-1-3, 1998
9. S. Niisaka, T. Saito, J. Saito, A. Tanaka, A. Matsumoto, M. Otani, R. Biro, C. Ouchi, M. Hasegawa, Y. Suzuki, K. Sone, "Development of optical coatings for 157-nm lithography. I. Coating materials" Appl. Optics 41 (2002), 3242-3247
10. L. J. Lingg, H. A. MacLeod, "Exploring the crystalline microstructure of thin films using a series of Lanthanide trifluorides as a probe", OSA Technical Digest Series "Optical Interference Coatings" 2001, TuE2-1-TuE2-3
11. 3 films for use in UV-coatings"; Proc. SPIE Vol. 3133 (1997), 183-193
12. R. Thielsch, A. Gatto, N. Kaiser, "Mechanical stress, and thermal-elastic properties of oxide coatings for use in the DUV spectral region", Applied Optics 41 (2002), 3211-3217
13. Manual "Thin Film Stress Measurement System TENCOR FLX 2320", KLA - Tencor, 160 Rio Robles, San Jose, CA 95134
14. R. Thielsch, J. Heber, H. Uhlig, N. Kaiser, "Development of mechanical stress in fluoride multi-layers for UV - applications", Proc. SPIE Vol. 5250 (2004), 127-136
15. S. Jakobs, A. Duparré, H .Truckenbrodt, "Interfacial roughness and related scatter in ultraviolet optical coatings: a systematic experimental approach" Appl. Optics 37 (1998), 1180-1193
16. U. Kaiser, N. Kaiser, P. Weißbrodt, D. Mademann, E. Hacker, H. Müller, "Structure of thin fluoride films deposited on amorphous substrates", Thin Solid Films 217 (1992), 217
17. R. Thielsch, J. Heber, H. Uhlig, N. Kaiser, "Development of mechanical stress in fluoride multi-layers for UV - applications", Proc. SPIE Vol. 5250 (2004), 127-136
18. 3 films deposited by resistive heating boat", OSA Technical Digest Series "Optical Interference Coatings" 2004, WF3/1 - 3
19. B.-C. Li, S. Martin, E. Welsch, R. Thielsch, J. Heber, N. Kaiser, " Pulsed top-hat beam thermal lens: a simple and sensitive tool for in-situ measurement on ultraviolet dielectric components", Proc. SPIE Vol. 3902 (1999) 470-478