High aspect-ratio polysilicon micromachining technology

Sensors and Actuators, A: Physical

Volumn 87, Issue 1-2, 2000, Pages 46-51

  Ayazi, Farrokh ^a   Najafi, Khalil ^a  

^a UNIVERSITY OF MICHIGAN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; DRY ETCHING; ENERGY GAP; MICROELECTRODES; MICROELECTROMECHANICAL DEVICES; MICROSTRUCTURE; MULTILAYERS; POLYSILICON; SILICON WAFERS; THERMODYNAMIC STABILITY;

AIR GAPS; ELECTRICALLY ISOLATED POLYSILICON; POLYSILICON MICROMACHING TECHNOLOGY; TEMPERATURE SENSITIVITY;

MICROMACHINING;

EID: 0034505170     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(00)00452-0     Document Type: Article

References (7)

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