Deposition of cathode coupled plasma enhanced chemical vapor deposition SiN films using liquid source material

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 42, Issue 9 AB, 2003, Pages

  Ohgishi, Atsufumi ^a   Motoyama, Shin Ichi ^a   Sawai, Mikio ^a   Tatsuta, Toshiaki ^a   Tsuji, Osamu ^a  

^a 33 Tanakamiya cho Takeda F   (Japan)

Author keywords

Cathode coupled PE CVD; HMDS; Insulating films; Liquid source; Optical coating films; Silicon nitride

Indexed keywords

AMMONIA; CATHODES; CHEMICAL BONDS; ELECTRIC BREAKDOWN OF SOLIDS; ELECTRODES; LIQUIDS; OPTICAL COATINGS; PHOTORESISTS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX;

HEXAMETHYLDISILAZANE; MONOSILANE; OPTICAL TRANSPARENCY;

SILICON NITRIDE;

EID: 0345356535     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.l1090     Document Type: Letter

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