Improvement in the electrical properties of ferroelectric SrBi 2Ta2O9 capacitors by electron beam irradiation on precursor films

Integrated Ferroelectrics

Volumn 39, Issue 1-4, 2001, Pages 101-108

  Okamura, Soichiro ^a   Kobayashi, Tomokazu ^a   Shiosaki, Tadashi ^a  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

Capacitor; Dose; Electron beam; Ferroelectric; SBT; Thin film

Indexed keywords

DETERIORATION; ELECTRON BEAMS; FERROELECTRIC FILMS; HEAT TREATMENT; LEAKAGE CURRENTS; THIN FILMS;

ELECTRICAL PROPERTIES; ELECTRON BEAM IRRADIATION; PATTERNING PROCESS; PRECURSOR FILMS;

CAPACITORS;

EID: 32444433833     PISSN: 10584587     EISSN: 16078489     Source Type: Conference Proceeding    
DOI: 10.1080/10584580108011932     Document Type: Conference Paper

References (12)

1. K. Kim, Integrated Ferroelectrics, 25 149 (1999).
2. Y. J. Song, H. H. Kim, S. Y. Lee, D. J. Jung, B. J. Koo, N. W. Chang, C. J. Kim and K. Kim, Integrated Ferroelectrics, 31 351 (2000).
3. W. Hartner, G Schindler, V. Weinrich, M. Ahlstedt, H. Schroeder, R. Waser, C. Dehm and C. Mazure, Integrated Ferroelectrics, 27 213 (1999).
4. K. Mori and S. Okamura, Jpn. J. Appl. Phys., 31 L1143 (1992).
5. A. Kakimi, S. Okamura, Y. Yagi, K. Mori andT. Tsukamoto, Jpn. J. Appl. Phys., 33 5301 (1994).
6. S. Okamura, A. Kakimi, Y. Yagi, K. Mori and T. Tsukamoto, Proc. 9th IEEE Inter. Symp. Appl. Ferroelectrics, IEEE 94CH3416-5 62 (1995).
7. S. Okamura, Y. Yagi, A. Kakimi, S. Ando, K. Mori and T. Tsukamoto, Jpn. J. Appl. Phys., 35 5224 (1996).
8. S. Okamura, Y. Yagi, S. Ando, T. Tsukamoto and K. Mori, Jpn. J. Appl. Phys., 35 6579 (1996).
9. S. Okamura, K. Mori, T. Tsukamoto and T. Shiosaki, Integrated Ferroelectrics, 18 311 (1997).
10. M. Alexe, C. Harnagea, D. Hesse and U. Gosele, Appl. Phys. Lett., 75 1793 (1999).
11. M. Alexe, C. Harnagea, A. pignolet, D. Hesse and U. Gosele, Piezoelectric Materials, 76 49 (2000).
12. S. Okamura, M. Takaoka, T. Nishida and T. Shiosaki, Jpn. J. Appl. Phys., 39 5481 (2000).