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Volumn 5, Issue SUPPL. 1, 2000, Pages

Activation of beryllium-implanted GaN by two-step annealing

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BERYLLIUM; CARRIER CONCENTRATION; CHEMICAL ACTIVATION; DIFFUSION; DOPING (ADDITIVES); HALL EFFECT; HOLE MOBILITY; ION IMPLANTATION; IONIZATION;

EID: 3242763814     PISSN: 10925783     EISSN: None     Source Type: Journal    
DOI: 10.1557/s1092578300004440     Document Type: Conference Paper
Times cited : (2)

References (20)
  • 15
    • 3242746346 scopus 로고    scopus 로고
    • Ed. S. J. Pearton Gordon and Breach, New York, ch. 12
    • J. C. Zolper, in : GaN and Related Materials, Ed. S. J. Pearton (Gordon and Breach, New York, 1997) ch. 12
    • (1997) GaN and Related Materials
    • Zolper, J.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.