Direct pattern etching for micromachining applications without the use of a resist mask

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 2769-2773

  Cho, Byeong Ok ^a   Ryu, Jung Hyun ^a   Hwang, Sung Wook ^a   Lee, Gyeo Re ^a   Moon, Sang Heup ^a  

^a Seoul National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

FILM GROWTH; LITHOGRAPHY; MASKS; MICROMACHINING; SILICA; STAINLESS STEEL; SUBSTRATES;

DIRECT PATTERN ETCHING; FARADAY CAGE; STAINLESS-STEEL STENCIL MASKS;

PLASMA ETCHING;

EID: 0034314706     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1322044     Document Type: Article

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