Microelectron field emitter array with focus lenses for multielectron beam lithography based on silicon on insulator wafer

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 3, 2004, Pages 1273-1276

  Minh, Phan Ngoc ^a,b   Ono, Takahito ^a   Sato, Nobuyuki ^a   Mimura, Hidenori ^a   Esashi, Masayoshi ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b INSTITUTE OF MATERIALS SCIENCE   (Viet Nam)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; DIAMONDS; ELECTRODES; FINITE ELEMENT METHOD; ION BEAM LITHOGRAPHY; MICROELECTRONICS; OXIDATION; PHOSPHORS; SCANNING TUNNELING MICROSCOPY; SILICON ON INSULATOR TECHNOLOGY; SUBSTRATES; THERMAL EFFECTS;

COMMON GATE ELECTRODES; MICROELECTRON FIELD EMITTER ARRAY; MULTIELECTRON BEAM LITHOGRAPHY;

ELECTRON EMISSION;

EID: 3242739372     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Conference Paper

References (18)

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