Vertically aligned carbon nanotubes produced by radio-frequency plasma-enhanced chemical vapor deposition at low temperature and their growth mechanism

Materials Chemistry and Physics

Volumn 87, Issue 1, 2004, Pages 31-38

  Shiratori, Y ^a,c   Hiraoka, H ^a   Yamamoto, M ^b  

^a Intl Center for Materials Research   (Japan)

^b RITSUMEIKAN UNIVERSITY   (Japan)

^c FORSCHUNGSZENTRUM JÜLICH   (Germany)

Author keywords

Carbon nanotubes; CVD; Field emission; Raman spectroscopy

Indexed keywords

CATALYST ACTIVITY; CRYSTAL GROWTH; DIFFUSION; DISSOLUTION; ELECTRIC POTENTIAL; KINETIC ENERGY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PRECIPITATION (CHEMICAL); RAMAN SPECTROSCOPY;

FIELD EMISSIONS; GROWTH RATES; RADIO FREQUENCY PLASMA SPUTTERING;

CARBON NANOTUBES;

EID: 3242690545     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2004.03.017     Document Type: Article

References (42)

1. Iijima S. Nature. 354:1991;56.
2. Fan S., Chapline M.G., Franklin N.R., Tombler T.W., Cassell A.M., Dai H. Science. 283:1999;512.
3. Lee C.J., Kim D.W., Lee T.J., Choi Y.C., Park Y.S., Lee Y.H., Choi W.B., Lee N.S., Park G.-S., Kim J.M. Chem. Phys. Lett. 312:1999;461.
4. Sohn J.I., Lee S., Song Y.-H., Choi S.-Y., Cho K.-I., Nam K.-S. Appl. Phys. Lett. 78:2001;901.
5. Thong J.T.L., Oon C.H., Eng W.K., Zhang W.D., Gan L.M. Appl. Phys. Lett. 79:2001;2811.
6. Ren Z.F., Huang Z.P., Xu J.W., Wang J.H., Bush P., Siegal M.P., Provencio P.N. Science. 282:1998;1105.
7. Choi Y.C., Shin Y.M., Lee Y.H., Lee B.S., Park G.S., Choi W.B., Lee N.S., Kim J.M. Appl. Phys. Lett. 76:2000;2367.
8. Chhowalla M., Teo K.B.K., Ducati C., Rupesinghe N.L., Amaratunga G.A.J., Ferrari A.C., Roy D., Robertson J., Milne W.I. J. Appl. Phys. 90:2001;5308.
9. Merkulov V.I., Melechko A.V., Guillorn M.A., Lowndes D.H., Simpson M.L. Chem. Phys. Lett. 361:2002;492.
10. Boskovic B.O., Stolojan V., Khan R.U.A., Haq S., Silva S.R.P. Nat. Mater. 1:2002;165.
11. Shiratori Y., Hiraoka H., Takeuchi Y., Itoh S., Yamamoto M. Appl. Phys. Lett. 82:2003;2485.
12. Hofmann S., Ducati C., Robertson J., Kleinsorge B. Appl. Phys. Lett. 83:2003;135.
13. Lee K.-Y., Katayama M., Honda S., Kuzuoka T., Miyake T., Terao Y., Lee J.-G., Mori H., Hirao T., Oura K. Jpn. J. Appl. Phys. 42:2003;804.
14. Tuinstra F., Koenig J.L. J. Chem. Phys. 53:1970;1126.
15. Lespade P., Al-Jishi R., Dresselhaus M.S. Carbon. 20:1982;427.
16. Al-Jishi R., Dresselhaus G. Phys. Rev. B. 26:1982;4514.
17. McCulloch D.G., Prawer S., Hoffman A. Phys. Rev. B. 50:1994;5905.
18. Beeman D., Silverman J., Lynds R., Anderson M.R. Phys. Rev. B. 30:1984;870.
19. Dillon R.O., Woollam J.A. Phys. Rev. B. 29:1984;3482.
20. Fowler R.H., Nordheim L.W. Proc. R. Soc. London, Ser. A. 119:1928;173.
21. Gröning O., Küttel O.M., Emmenegger Ch., Gröning P., Schlapbach L. J. Vac. Sci. Technol. B. 18:2000;665.
22. Kobayashi K., Mutsukura N., Machi Y. Thin Solid Films. 200:1991;139.
23. Chung S.J., Lim S.H., Jang J. Thin Solid Films. 383:2001;73.
24. Nyberg T., Heszler P., Carlsson J.O. Diam. Relat. Mater. 6:1997;85.
25. Knight D.S., White W.B. J. Mater. Res. 4:1989;385.
26. Terrones H., Hayashi T., Muñoz-Navia M., Terrones M., Kim Y.A., Grobert N., Kamalakaran R., Dorantes-Dávila J., Escudero R., Dresselhaus M.S., Endo M. Chem. Phys. Lett. 343:2001;241.
27. Li W., Zhang H., Wang C., Zhang Y., Xu L., Zhu K., Xie S. Appl. Phys. Lett. 70:1997;2684.
28. Sveningsson M., Morjan R.-E., Nerushev O.A., Sato Y., Bäckström J., Campbell E.E.B., Rohmund F. Appl. Phys. A. 73:2001;409.
29. Musatov A.L., Kiselev N.A., Zakharov D.N., Kukovitskii E.F., Zhbanov A.I., Izrael'yants K.R., Chirkova E.G. Appl. Surf. Sci. 183:2001;111.
30. Smith R.C., Carey J.D., Poa C.H.P., Cox D.C., Silva S.R.P. J. Appl. Phys. 95:2004;3153.
31. C.C. Chuang, J.H. Huang, W.J. Chen, C.C. Lee, Y.Y. Chang, Diam. Relat. Mater. 13 (2004) 1012.
32. Fujii T. Phys. Rev. E. 58:1998;6495.
33. R.C. Reid, J.M. Prausnitz, B.E. Poling, The Properties of Gases and Liquids, 4th ed., McGraw-Hill Book Company, New York, 1986 (Appendix B).
34. Mutsukura N., Kobayashi K., Machi Y. J. Appl. Phys. 68:1990;2657.
35. Baker R.T.K., Barber M.A., Harris P.S., Feates F.S., Waite R.J. J. Catal. 26:1972;51.
36. Baker R.T.K., Harris P.S., Thomas R.B., Waite R.J. J. Catal. 30:1973;86.
37. Alstrup I. J. Catal. 109:1988;241.
38. Yang R.T., Chen J.P. J. Catal. 115:1989;52.
39. Helveg S., López-Cartes C., Sehested J., Hansen P.L., Clausen B.S., Rostrup-Nielsen J.R., Abild-Pedersen F., Nørskov J.K. Nature. 427:2004;426.
40. 2 organic substances in SI units, J. Phys. Chem. Ref. Data 11 (Suppl. 2) (1982) 2-38.
41. S.G. Lias, in: D.R. Lide (Ed.), CRC Handbook of Chemistry and Physics, 82nd ed., CRC Press, Boca Raton, FL, 2001, Chapter 10, p. 178.
42. Kang H., Kasi S.R., Rabalais J.W. J. Chem. Phys. 88:1988;5882.