SCOPUS 정보 검색 플랫폼

Applied Physics A: Materials Science and Processing

Volumn 73, Issue 4, 2001, Pages 409-418

Raman spectroscopy and field-emission properties of CVD-grown carbon-nanotube films

(7) Sveningsson, M a Morjan, R E a Nerushev, O A a Sato, Y a Backstrom J a Campbell, E E B a Rohmund, F a

a UNIVERSITY OF GOTHENBURG (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; CURRENT DENSITY; ELECTRON EMISSION; FIELD EMISSION CATHODES; FILMS; IMPURITIES; MORPHOLOGY; RAMAN SPECTROSCOPY; SYNTHESIS (CHEMICAL);

CARBON NANOTUBE FILM; ELECTRON-EMISSION CURRENT DENSITY; FIELD-EMISSION PROPERTY; MULTI-WALL NANOTUBE; MULTI-WALL NANOTUBE FILM; THERMAL CHEMICAL VAPOUR DEPOSITION;

CARBON NANOTUBES;

EID: 0035478842 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s003390100923 Document Type: Article

Times cited : (203)

References (39)

1
- 0003433701
- (Imperial College, London)
- (1998) Physical Properties of Carbon Nanotubes
- Saito, R.¹ Dresselhaus, G.² Dresselhaus, M.S.³

2
- 9744279393
- (1995) Science , vol.270 , pp. 1179
- De Heer, W.A.¹ Chatelain, A.² Ugarte, D.³

3
- 0001164275
- (1998) Appl. Phys. Lett. , vol.72 , pp. 2912
- Wang, Q.H.¹ Setlur, A.A.² Lauerhaas, J.M.³ Dai, J.Y.⁴ Seelig, E.W.⁵ Chang, R.P.H.⁶

4
- 0033729680
- (2000) Diamond Relat. Mater. , vol.9 , pp. 1184
- Kim, J.M.¹ Choi, W.B.² Lee, N.S.³ Jung, J.E.⁴

5
- 0033882101
- (2000) Carbon , vol.38 , pp. 169
- Saito, Y.¹ Uemura, S.²

6
- 0042691387
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1668
- Rosen, R.¹ Simendinger, W.² Debbault, C.³ Shimoda, H.⁴ Flening, L.⁵ Stoner, B.⁶ Zhou, O.⁷

7
- 0347523033
- (1996) Appl. Phys. Lett. , vol.69 , pp. 1969
- Collins, P.G.¹ Zettl, A.²

8
- 0000206724
- (1997) Appl. Phys. Lett. , vol.70 , pp. 2679
- Schmid, H.¹ Fink, H.-W.²

9
- 5944246146
- (1997) Appl. Phys. Lett. , vol.70 , pp. 3308
- Wang, Q.H.¹ Corrigan, T.D.² Dai, J.Y.³ Chang, R.P.H.⁴ Krauss, A.R.⁵

10
- 0032655482
- (1999) Appl. Phys. A , vol.69 , pp. 245
- Bonard, J.-M.¹ Salvetat, J.-P.² Stöckli, T.³ Forró, L.⁴ Châtelain, A.⁵

11
- 0034246977
- (2000) Appl. Phys. A , vol.71 , pp. 121
- Monteiro, O.R.¹ Mammana, V.P.² Salvadori, M.C.³ Ager, J.W.⁴ Dimitrijevic, S.⁵

12
- 0035079442
- (2001) J. Vac. Sci. Technol. B , vol.19 , pp. 23
- Kwo, J.L.¹ Tsou, C.C.² Yokoyama, M.³ Lin, I.N.⁴ Lee, C.C.⁵ Wang, W.C.⁶ Chuang, F.Y.⁷

13
- 0347484144
- (1998) Appl. Phys. Lett. , vol.73 , pp. 2113
- Küttel, O.¹ Groening, O.² Emmenegger, C.³ Schlapbach, L.⁴

14
- 0034156486
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 665
- Gröning, O.¹ Küttel, O.M.² Emmenegger, C.³ Gröning, P.⁴ Schlapbach, L.⁵

15
- 0042850606
- (1998) Appl. Phys. Lett. , vol.73 , pp. 2119
- Chen, Y.¹ Patel, S.² Ye, Y.³ Shaw, D.T.⁴ Guo, L.⁵

16
- 0000734659
- (2000) Appl. Phys. Lett. , vol.76 , pp. 2469
- Chen, Y.¹ Shaw, D.T.² Guo, L.³

17
- 0034155793
- (2000) J. Vac. Sci. Technol. B , vol.18 , pp. 1059
- Obraztsov, A.N.¹ Pavlovsky, I.² Volkov, A.P.³ Obraztsova, E.D.⁴ Chuvilin, A.L.⁵ Kuznetsov, V.L.⁶

18
- 0001662947
- (2000) Appl. Phys. Lett. , vol.76 , pp. 3813
- Rao, A.M.¹ Jacques, D.² Haddon, R.C.³ Zhu, W.⁴ Bower, C.⁵ Jin, S.⁶

19
- 0001625369
- (2000) Chem. Phys. Lett. , vol.326 , pp. 175
- Lee, C.J.¹ Park, J.² Kang, S.Y.³ Lee, J.H.⁴

20
- 0035280575
- (2001) J. Phys. Chem. B , vol.105 , pp. 1519
- Pan, Z.W.¹ Au, F.C.K.² Lai, H.L.³ Zhou, W.Y.⁴ Sun, L.F.⁵ Liu, Z.Q.⁶ Tang, D.S.⁷ Lee, C.S.⁸ Lee, S.T.⁹ Xie, S.S.¹⁰

21
- 0000609573
- (2000) Appl. Phys. Lett. , vol.76 , pp. 1776
- Murakami, H.¹ Hirakawa, M.² Tanaka, C.³ Yamakawa, H.⁴

22
- 0000582081
- (2001) Appl. Phys. Lett. , vol.78 , pp. 901
- Sohn, J.I.¹ Lee, S.² Song, Y.-H.³ Choi, S.-Y.⁴ Cho, K.-I.⁵ Nam, K.-S.⁶

23
- 0033593584
- (1999) Science , vol.283 , pp. 512
- Fan, S.¹ Chapline, M.G.² Franklin, N.R.³ Tombler, T.W.⁴ Cassel, A.M.⁵ Dai, H.⁶

24
- 0033362634
- (1999) Adv. Mater. , vol.11 , pp. 1285
- Kind, H.¹ Bonard, J.-M.² Emmenegger, C.³ Nilsson, L.O.⁴ Hernadi, K.⁵ Mailard-Schaller, E.⁶ Schlapbach, L.⁷ Forro, L.⁸ Kern, K.⁹

25
- 0000961126
- (1998) Appl. Phys. Lett. , vol.73 , pp. 918
- Bonard, J.-M.¹ Salvetat, J.-P.² Stöckli, T.³ De Heer, W.A.⁴ Forró, L.⁵ Châtelain, A.⁶

26
- 0032620880
- (1999) Appl. Phys. Lett. , vol.75 , pp. 873
- Zhu, W.¹ Bower, C.² Zhou, O.³ Kochanski, G.⁴ Jin, S.⁵

27
- 11944268480
- (1995) Science , vol.269 , pp. 1550
- Rinzler, A.G.¹ Hafner, J.H.² Nikolaev, P.³ Lou, L.⁴ Kim, S.G.⁵ Tomanek, D.⁶ Nordlander, P.⁷ Colbert, D.T.⁸ Smalley, R.E.⁹

28
- 11544301578
- (1998) Phys. Rev. Lett. , vol.81 , pp. 1441
- Bonard, J.-M.¹ Stöckli, T.² Maier, F.³ De Heer, W.A.⁴ Châtelain, A.⁵ Salvetat, P.⁶ Forró, L.⁷

29
- 0001428318
- (1999) Appl. Phys. Lett. , vol.75 , pp. 2773
- Dean, K.A.¹ Groening, O.² Küttel, O.M.³ Schlapbach, L.⁴

30
- 0035044013
- (2001) J. Mater. Chem. , vol.11 , pp. 1122
- Nerushev, O.A.¹ Sveningsson, M.² Falk, L.K.L.³ Rohmund, F.⁴

31
- 0034286596
- (2000) Adv. Phys. , vol.49 , pp. 705
- Dresselhaus, M.S.¹ Eklund, P.C.²

32
- 0029229357
- (1995) Carbon , vol.33 , pp. 959
- Eklund, P.C.¹ Holden, J.M.² Jishi, R.A.³

33
- 0000264209
- (1997) Appl. Phys. Lett. , vol.70 , pp. 2684
- Li, W.¹ Zhang, H.² Wang, C.³ Zhang, Y.⁴ Xu, L.⁵ Zhu, K.⁶ Xie, S.⁷

34
- 0000665351
- ed. by W.H. Weber, R. Merlin (Springer, Berlin)
- (2000) Raman Scattering in Materials Science , pp. 314
- Dresselhaus, M.S.¹ Pimenta, M.A.² Eklund, P.C.³ Dresselhaus, G.⁴

35
- 35949019851
- (1982) Phys. Rev. B. , vol.24 , pp. 4142
- Elman, B.S.¹ Shayegan, M.² Dresselhaus, M.S.³ Mazurek, H.⁴ Dresselhaus, G.⁵

36
- 15444347981
- (1997) Science , vol.275 , pp. 187
- Rao, A.M.¹ Richter, E.² Bandow, S.³ Chase, B.⁴ Eklund, P.C.⁵ Williams, K.A.⁶ Fang, S.⁷ Subbaswamy, K.R.⁸ Menon, M.⁹ Thess, A.¹⁰ Smalley, R.E.¹¹ Dresselhaus, G.¹² Dresselhaus, M.S.¹³

37
- 85016910436
- submitted for publication
- (2001)
- Morjan, R.-E.¹ Nerushey, O.A.² Sveningsson, M.³ Falk, L.K.L.⁴ Campbell, E.E.B.⁵ Rohmund, F.⁶

38
- 0000928931
- (1928) Proc. R. Soc. Lond. Ser. A , vol.119 , pp. 173
- Fowler, R.H.¹ Nordheim, L.²

39
- 0000671163
- (2000) Chem. Phys. Lett. , vol.323 , pp. 554
- Lee, C.J.¹ Park, J.² Kang, S.Y.³ Lee, J.H.⁴

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.