Magnetotransport properties of Co-Fe/Al-N/Co-Fe tunnel junctions with large tunnel magnetoresistance ratio

Applied Physics Letters

Volumn 85, Issue 1, 2004, Pages 82-84

  Yoon, Tae Sick ^a   Kim, Chong Oh ^a   Shoyama, Toshihiro ^b   Tsunoda, Masakiyo ^b   Takahashi, Migaku ^b  

^a Chungnam National University   (South Korea)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ANNEALING; COBALT COMPOUNDS; ELECTRIC RESISTANCE; FABRICATION; FERROMAGNETIC MATERIALS; GRAIN BOUNDARIES; MAGNETIC FILMS; MAGNETORESISTANCE; RANDOM ACCESS STORAGE; TANTALUM COMPOUNDS;

MAGNETIC TUNNEL JUNCTION (MTJ); NITRIDATION; TUNNEL MAGNETORESISTANCE RATIO (MTR);

TUNNEL JUNCTIONS;

EID: 3242681765     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1765203     Document Type: Article

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