RF microplasma jet at atmospheric pressure: Application to rapid recrystallization of amorphous silicon

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 44, Issue 24-27, 2005, Pages

  Sakurai, Yusuke ^a   Kobayashi, Tomohiro ^b   Hasegawa, Yasuhiro ^a   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

^b INST OF PHYS AND CHEMICAL RESEARCH   (Japan)

Author keywords

a Si; Plasma annealing; poly Si; Rapid recrystallization; rf microplasma jet

Indexed keywords

ATMOSPHERIC PRESSURE; DEPOSITION; JETS; PLASMAS; POLYCRYSTALLINE MATERIALS; RECRYSTALLIZATION (METALLURGY);

FILM CRYSTALLINITY; PLASMA ANNEALING; RAPID RECRYSTALLIZATION; RF MICROPLASMA JET;

AMORPHOUS SILICON;

EID: 32044439363     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.L749     Document Type: Article

References (16)

1. J. Meier, P. Torres, R. Platz, S. Dubail, U. Kroll, J. A. N. Selvan, N. Pellaton Vaucher, Ch. H. of, D. Fischer, H. Keppner, A. Shat, K.-D. Ufert, P. Giannoules and J. Koehler: Mater. Res. Soc. Symp. Proc. 420 (1996) 3.
2. K. Yamamoto, M. Miyoshi, T. Suzuki, Y. Tawada, T. Okamoto and A. Nakajima: Mater. Res. Soc. Symp. Proc. 507 (1998) 131.
3. J. W. Lee, K. Shimizu and J. Hanna: Solid State Phenom. 93 (2003) 281.
4. S. D. Brotherton: Semicond. Sci. Technol. 10 (1995) 721.
5. C. A. Armiento and F. C. Prince: Appl. Phys. Lett. 48 (1986) 1623.
6. A. Tamura, T. Uenomiya, K. Nishii, K. Inoue and T. Onuma: J. Appl. Phys. 62 (1987) 1102.
7. S. Horita, D. Inagaki and K. Sato: Thin Solid Films 343-344 (1999) 288.
8. N. Andoh and T. Sameshima: Solid State Phenom. 93 (2003) 179.
9. S. Higashi, H. Kaku, H. Murakami, S. Miyazaki, H. Watanabe, N. Ando and T. Sameshima: Jpn. J. Appl. Phys. 44 (2005) L108.
10. Z. Yang, T. Kikuchi, H. Hatou, T. Kobayashi and H. Shirai: to be published in Jpn. J. Appl. Phys. 44 (2005).
11. H. Shirai, T. Kobayashi and Y. Hasegawa: to be published in Appl. Phys. Lett.
12. R. M. Sankaran and K. P. Giapis: Appl. Phys. Lett. 79 (2001) 593.
13. R. M. Sankaran and K. P. Giapis: J. Appl. Phys. 92 (2002) 2406.
14. T. Ichiki, R. Tarui and Y. Horiike: Proc. 24th Int. Symp. Dry Process, Tokyo, 2002, p. 69.
15. K. Terashima, Y. Taniguchi, N. Yamaguchi, Y. Takamura and T. Yoshida: Thin Solid Films 345 (1999) 146.
16. T. Kikuchi, Y. Hasegawa and H. Shirai: J. Phys. D 37 (2004) 1537.