Rf microplasma jet at atmospheric pressure: Characterization and application to thin film processing

Journal of Physics D: Applied Physics

Volumn 37, Issue 11, 2004, Pages 1537-1543

  Kikuchi, Tomoyuki ^a   Hasegawa, Yasuhiro ^a   Shirai, Hajime ^a  

^a SAITAMA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC DISCHARGES; GAS FLOW; OPTICAL EMISSION SPECTROSCOPY (OES);

ATMOSPHERIC PRESSURE; CARBON NANOTUBES; DEPOSITION; ELECTRODES; GRAPHITE; LIGHT EMISSION; OXIDATION; SILICON; SYNTHESIS (CHEMICAL); THIN FILMS; ULTRAVIOLET RADIATION;

PLASMA JETS;

EID: 2942563957     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/37/11/005     Document Type: Article

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