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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 8, 2005, Pages 6124-6130

Physical and microstructural properties of radio-frequency plasma-enhanced chemical vapor deposition grown n-type phosphorus doped amorphous carbon films on the contribution to carbon-based solar cells

(5) Rusop, Mohamad a Ebisu, Hiroshi a Adachi, Mitsuhiro a Soga, Tetsuo a Jimbo, Takashi a

a NAGOYA INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

ESR; FTIR; PECVD; Phosphorus doped; Raman; Rf CVD; Solar cells

Indexed keywords

AMORPHOUS MATERIALS; CURRENT DENSITY; ELECTRIC RESISTANCE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SOLAR CELLS; THIN FILMS;

PHOSPHORUS-DOPED; RAMAN; RF-CVD;

CARBON;

EID: 31644450360 PISSN: 00214922 EISSN: 13474065 Source Type: Journal
DOI: 10.1143/JJAP.44.6124 Document Type: Article

Times cited : (6)

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