Highly concentrated ozone gas for preparing wettable polyimide surface

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 A, 2005, Pages 5225-5230

  Koike, Kunihiko ^a   Aida, Toshihiro ^a   Habuka, Hitoshi ^b  

^a Iwatani International Corporation   (Japan)

^b YOKOHAMA NATIONAL UNIVERSITY   (Japan)

Author keywords

Ozone; Polyimide film; Water contact angle; Wettability

Indexed keywords

ATOMIC FORCE MICROSCOPY; CONTACT ANGLE; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYIMIDE FILM; WATER CONTACT ANGLE; WETTABILITY;

OZONE;

EID: 31644436333     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.5225     Document Type: Article

References (35)

1. J. C. Block: Ozonation Manual for Water and Waste Water Treatment (Noyes Publications, London, 1982) Chap. 13, p. 66.
2. R. R. Sowell, R. E. Cutherell, D. M. Mattox and R. D. Bland: J. Vac. Sci. Technol. 11 (1974) 474.
3. S. Hosokawa and S. Ichimura: Rev. Sci. Instrum. 62 (1991) 1614.
4. K. Koike, G. Inoue, T. Fukuda, S. Ichimura and A. Kurokawa: Rev. Sci. Instrum. 71 (2000) 4182.
5. K. Koike, G. Inoue and T. Takata: Jpn. J. Appl. Phys. 36 (1997) 7437.
6. K. Koike, G. Inoue, S. Ichimura, K. Nakamura, A. Kurokawa and H. Nonaka: Mater. Res. Soc. Symp. Proc. 567 (1999) 121.
7. D. Wilson: in Polyimides, eds. D. Wilson, H. D. Stenzenberger and P. M. Hergenrother (Chapman and Hall, New York, 1990) p. 195.
8. E. H. Lee: Polyimides Fundamentals and Applications (Marcel Dekker, New York, 1996).
9. M. Matsuguchi, E. Hirota, T. Kuroiwa, S. Obara, T. Ogura and Y. Sakai: J. Electrochem. Soc. 147 (2000) 2796.
10. H. Gleskova, S. Wagner, V. Gasparik and P. Kovac: J. Electrochem. Soc. 148 (2001) 0370.
11. H. Suzuki and T. Tsura: J. Electrochem. Soc. 148 (2001) E468.
12. C. Liu, N. Cui, N. M. D. Brown and B. J. Meenan: Surf. Coat. Technol. 185 (2004) 311.
13. G. Rozovskis, J. Vinkevicius and J. Jaciauskiene: J. Adhes. Sci. Technol. 10 (1996) 399.
14. Y. J. Hwang, S. Matthews, M. McCord and M. Bourham: J. Electrochem. Soc. 151 (2004) C495.
15. M. Naddaf, C. Balasubramanian, P. S. Alegaonkar, V. N. Bhoraskar, A. B. Mandel, V. Ganeshan and S. V. Bhoraskar: Nucl. Instrum. Methods Phys. Res., Sect. B 222 (2004) 135.
16. A. Weber, A. Dietz, R. Poeckelmann and C. P. Klages: J. Electrochem. Soc. 144 (1997) 1131.
17. M. Celina, H. Kudoh, T. J. Renk, K. T. Gillen and R. L. Clough: Radiat. Phys. Chem. 51 (1998) 191.
18. M. Iwak: Nucl. Instrum. Methods Phys. Res., Sect. B 175-177 (2001) 368.
19. H. Niino and A. Yabe: Appl. Surf. Sci. 69 (1993) 1.
20. K. Gotoh, Y. Nakata, M. Tagawa and M. Tagawa: Colloids Surf. A 224 (2003) 165.
21. I. Ghosh, J. Konar and A. K. Bhowmick: J. Adhes. Sci. Technol. 11 (1997) 877.
22. D. Kim and Y. R. Shen: Appl. Phys. Lett. 74 (1999) 3314.
23. T. N. Vorobyova: J. Adhes. Sci. Technol. 11 (1997) 167.
24. K. W. Lee, S. P. Kowalczyk and J. M. Shaw: Macromolecules 23 (1990) 2097.
25. N. C. Stoffel, M. Hsieh, S. Chandra and E. J. Kramer: Chem. Mater. 8 (1996) 1035.
26. T. H. Baum, D. C. Miller and T. R. O'Toole: Chem. Mater. 3 (1991) 714.
27. F. Santoso, W. Albrecht, M. Schroeter, Th. Weigel, D. Paul and R. Schomaecker: J. Membr. Sci. 223 (2003) 171.
28. J. Y. Song, Y. Y. Wang and C. C. Wan: J. Electrochem. Soc. 147 (2000) 3219.
29. S. Ono: Hyomen Choryoku (Kyoritsu Shuppan, Tokyo, 1980) [in Japanese].
30. M. Morra, E. Occhiello and F. Garbassi: J. Colloid Interface Sci. 132 (1989) 405.
31. M. J. Owen and P. J. Smith: J. Adhes. Sci. Technol. 8 (1994) 1063.
32. E. P. Everaert, H. C. van der Mei, J. de Vries and H. J. Busscher: J. Adhes. Sci. Technol. 9 (1995) 1263.
33. B. K. Kim, K. S. Kim, K. Cho and C. E. Park: J. Adhes. Sci. Technol. 15 (2001) 1805.
34. M. Amagai: Erekutononikusu Jisso Gakkaishi 3 (2000) 569 [in Japanese].
35. H. Habuka, Y. Shimazaki, S. Okamura, F. Sugimoto, T. Takeuchi, M. Aihara, M. Shimada and K. Okuyama: Jpn. J. Appl. Phys. 42 (2003) 1575.