Observation of heat-induced particle resuspension and transport in a plasma chemical vapor deposition chamber

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 44, Issue 7 A, 2005, Pages 4871-4877

  Moriya, Tsuyoshi ^a,b   Shimada, Manabu ^b   Okuyama, Kikuo ^b   Setyawan, Heru ^c,d  

^a TOKYO ELECTRON LTD   (Japan)

^b HIROSHIMA UNIVERSITY   (Japan)

^c DEPARTMENT OF ELECTRICAL ENGINEERING   (Indonesia)

^d JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Laser light scattering; Particle resuspension; Plasma CVD chamber; Thermal stress; Thermophoretic force

Indexed keywords

ELECTROSTATICS; ELEMENTARY PARTICLES; LIGHT SCATTERING; THERMAL EXPANSION; THERMAL STRESS; THERMOPHORESIS;

LASER LIGHT SCATTERING; PARTICLE RESUSPENSION; PLASMA CVD CHAMBER;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 31544470074     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.44.4871     Document Type: Article

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