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Volumn 34, Issue 7, 2003, Pages 923-936
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Characterization of particle contamination in process steps during plasma-enhanced chemical vapor deposition operation
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL REACTORS;
LIGHT SCATTERING;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SCANNING ELECTRON MICROSCOPY;
THERMOPHORESIS;
PARTICLE MOTION;
CONTAMINATION;
CHEMICAL VAPOR DEPOSITION;
ARTICLE;
CHEMICAL REACTION;
ELECTRODE;
LIGHT SCATTERING;
MOLECULAR DYNAMICS;
PARTICLE SIZE;
PRIORITY JOURNAL;
SCANNING ELECTRON MICROSCOPY;
VAPOR;
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EID: 0037824579
PISSN: 00218502
EISSN: None
Source Type: Journal
DOI: 10.1016/S0021-8502(03)00066-1 Document Type: Article |
Times cited : (22)
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References (11)
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