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Volumn 34, Issue 7, 2003, Pages 923-936

Characterization of particle contamination in process steps during plasma-enhanced chemical vapor deposition operation

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; LIGHT SCATTERING; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SCANNING ELECTRON MICROSCOPY; THERMOPHORESIS;

EID: 0037824579     PISSN: 00218502     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0021-8502(03)00066-1     Document Type: Article
Times cited : (22)

References (11)
  • 2
    • 0004830485 scopus 로고    scopus 로고
    • Plasma charge-density ratios in a dusty plasma
    • Childs M.A., Gallagher A. Plasma charge-density ratios in a dusty plasma. Journal of Applied Physics. 87:2000;1086-1090.
    • (2000) Journal of Applied Physics , vol.87 , pp. 1086-1090
    • Childs, M.A.1    Gallagher, A.2
  • 3
    • 0030525582 scopus 로고    scopus 로고
    • Massively parallel simulations of Brownian dynamics particle transport in low pressure parallel-plate reactors
    • Choi S.J., Rader D.J., Geller A.S. Massively parallel simulations of Brownian dynamics particle transport in low pressure parallel-plate reactors. Journal of Vacuum Science and Technology A. 14:1996;660-665.
    • (1996) Journal of Vacuum Science and Technology A , vol.14 , pp. 660-665
    • Choi, S.J.1    Rader, D.J.2    Geller, A.S.3
  • 5
    • 0030528970 scopus 로고    scopus 로고
    • Particle trapping, transport, and charge in capacitively and inductively coupled argon plasmas in a gaseous conference reference cell
    • Collins S.M., Brown D.A., O'Hanlon J.F., Carlile R.N. Particle trapping, transport, and charge in capacitively and inductively coupled argon plasmas in a gaseous conference reference cell. Journal of Vacuum Science and Technology A. 14:1996;634-638.
    • (1996) Journal of Vacuum Science and Technology A , vol.14 , pp. 634-638
    • Collins, S.M.1    Brown, D.A.2    O'Hanlon, J.F.3    Carlile, R.N.4
  • 8
    • 0037169327 scopus 로고    scopus 로고
    • Visualization and numerical simulation of fine particle transport in a low-pressure parallel plate chemical vapor deposition reactor
    • Setyawan H., Shimada M., Ohtsuka K., Okuyama K. Visualization and numerical simulation of fine particle transport in a low-pressure parallel plate chemical vapor deposition reactor. Chemical Engineering Science. 57:2002;497-506.
    • (2002) Chemical Engineering Science , vol.57 , pp. 497-506
    • Setyawan, H.1    Shimada, M.2    Ohtsuka, K.3    Okuyama, K.4
  • 9
    • 18744361948 scopus 로고    scopus 로고
    • Characterization of fine particle trapping in a plasma-enhanced chemical vapor deposition reactor
    • Setyawan H., Shimada M., Okuyama K. Characterization of fine particle trapping in a plasma-enhanced chemical vapor deposition reactor. Journal of Applied Physics. 92:2002;5525-5531.
    • (2002) Journal of Applied Physics , vol.92 , pp. 5525-5531
    • Setyawan, H.1    Shimada, M.2    Okuyama, K.3
  • 11
    • 21844514071 scopus 로고
    • Dynamics of particulates in the afterglow of a radio frequency excited plasma
    • Yeon C.K., Kim J.H., Whang K.W. Dynamics of particulates in the afterglow of a radio frequency excited plasma. Journal of Vacuum Science and Technology A. 13:1995;927-930.
    • (1995) Journal of Vacuum Science and Technology A , vol.13 , pp. 927-930
    • Yeon, C.K.1    Kim, J.H.2    Whang, K.W.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.