Removing spherical silica particles from Si, Ge and NiP substrates by KrF excimer laser

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 39, Issue 10, 2000, Pages 5894-5898

  Zheng, Yuan Wei ^a   Lu, Yong Feng ^a   Mai, Zhi Hong ^a   Song, Wen Dong ^a  

^a NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ATOMIC FORCE MICROSCOPY; EXCIMER LASERS; GERMANIUM; LASER APPLICATIONS; NICKEL COMPOUNDS; OPTICAL PROPERTIES; PARTICLE SIZE ANALYSIS; PARTICLES (PARTICULATE MATTER); SILICON; THERMODYNAMIC PROPERTIES;

LASER CLEANING; NICKEL PHOSPHIDE;

SILICA;

EID: 0034291925     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.5894     Document Type: Article

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