Analysis of thermal distribution in low-temperature polycrystalline silicon p-channel thin film transistors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 45, Issue 1 A, 2006, Pages 7-12

  Hashimoto, Shinichiro ^a   Uraoka, Yukiharu ^a   Fuyuki, Takashi ^a   Morita, Yukihiro ^b  

^a NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

^b PANASONIC CORPORATION   (Japan)

Author keywords

Low temperature poly Si; Thermal degradation; Thermal distribution; Thin film transistor

Indexed keywords

ELECTRIC POTENTIAL; HEATING; INFRARED IMAGING; POLYCRYSTALLINE MATERIALS; PYROLYSIS; SIMULATORS;

BIAS VOLTAGE; LOW-TEMPERATURE POLY-SI; THERMAL DISTRIBUTION;

THIN FILM TRANSISTORS;

EID: 31544467298     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.45.7     Document Type: Article

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