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Japanese Journal of Applied Physics, Part 2: Letters

Volumn 35, Issue 3 A, 1996, Pages

Measurements of temperature distribution in polycrystalline thin film transistors caused by self-heating

(3) Sameshima, Toshiyuki a Sunaga, Yuji a Kohno, Atsushi b

a TOKYO UNIVERSITY OF AGRICULTURE AND TECHNOLOGY (Japan)

b KYUSHU UNIVERSITY (Japan)

Author keywords

Heat diffusion; Laser crystallization; Transient thermometry

Indexed keywords

CRYSTALLIZATION; LASER APPLICATIONS; POLYCRYSTALLINE MATERIALS; SEMICONDUCTING SILICON; TEMPERATURE DISTRIBUTION; TEMPERATURE MEASUREMENT; THERMAL DIFFUSION IN SOLIDS; THIN FILM DEVICES;

DRAIN EDGES; SELF HEATING; TRANSIENT THERMOMETRY;

TRANSISTORS;

EID: 0030107002 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.35.l308 Document Type: Article

Times cited : (17)

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