Focused ion beam etching of resist/Ni multilayer films and applications to metal island structure formation

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 2511-2514

  Nakayama, Masayoshi ^a   Wakaya, Fujio ^a   Yanagisawa, Junichi ^a   Gamo, Kenji ^a  

^a OSAKA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0342989491     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590200     Document Type: Article

References (10)

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