Fabrication and replication of polymer integrated optical devices using electron-beam lithography and soft lithography

Journal of Physical Chemistry B

Volumn 108, Issue 25, 2004, Pages 8606-8613

  Huang, Yanyi ^a   Paloczi, George T ^a   Yariv, Amnon ^a   Zhang, Cheng ^b   Dalton, Larry R ^c  

^a California Institute of Technology   (United States)

^b Pacific Wave Industries Ltd   (United States)

^c UNIVERSITY OF WASHINGTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY (EBL); POLYMER INTEGRATED OPTICAL DEVICES; SOFT LITHOGRAPHY;

ELECTRON BEAMS; FABRICATION; INTERFEROMETERS; ION BEAM LITHOGRAPHY; OPTICAL FILTERS; POLYMERS; RESONANCE; WAVEGUIDES;

OPTICAL DEVICES;

EID: 3142685319     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp049724d     Document Type: Article

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