In situ fabrication of a cross-bridge Kelvin resistor structure by focused ion beam microscopy

Nanotechnology

Volumn 15, Issue 7, 2004, Pages 786-789

  Leung, C W ^a   Bell, C ^a   Burnell, G ^a   Blamire, M G ^a  

^a UNIVERSITY OF CAMBRIDGE   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC CURRENTS; ELECTRIC RESISTANCE; ETCHING; HETEROJUNCTIONS; OPTICAL INTERCONNECTS; RESISTORS;

IN SITU FABRICATION; ION BEAM MICROSCOPY; KELVIN RESISTORS; MATERIAL SYSTEMS;

ION BEAMS;

EID: 3142673430     PISSN: 09574484     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-4484/15/7/012     Document Type: Article

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