Electrical modelling of Kelvin structures for the derivation of low specific contact resistivity

European Solid-State Device Research Conference

Volumn , Issue , 1997, Pages 492-495

  Reeves, Geoffrey K ^a   Holland, Anthony S ^a   Harrison, Barry ^b   Leech, Patrick W ^c  

^a RMIT UNIVERSITY   (Australia)

^b GRIFFITH UNIVERSITY   (Australia)

^c CSIRO   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

OHMIC CONTACTS; SEMICONDUCTOR DEVICES;

CROSS-BRIDGE KELVIN RESISTORS; KELVIN STRUCTURES; LOW RESISTANCE; MULTIPLE STRUCTURES; SEMICONDUCTOR PROCESSING; SPECIFIC CONTACT RESISTANCES; SPECIFIC CONTACT RESISTIVITY; TEST STRUCTURE;

RESISTORS;

EID: 84907560910     PISSN: 19308876     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ESSDERC.1997.194473     Document Type: Conference Paper

References (4)

1. W. M. Loh, K. Saraswat and R. W. Dutton, IEEE Electron. Device Letters, vol. EDL-6, no.3, 1985, pp. 105-108.
2. W. M. Loh, S. E. Swirhun, T. A. Schreyer, R. M. Swanson and K. C. Saraswat, IEEE Trans. Electron. Dev., vol. ED-34, no.3, 1987, pp. 512-523.
3. A. S. Holland, G. K. Reeves, H. B. Harrison, ICMTS 97, Monterey, March 1997. pp95-98.
4. T. Ohmi, Microelectronics Journal, vol. 26, no.6, 1995, pp. 565-619.