2-step growth method and microcrystalline silicon thin film solar cells prepared by hot wire cell method

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 A, 2004, Pages 2419-2424

  Ide, Yoshinori ^a   Saito, Yuji ^a   Yamada, Akira ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Hot Wire Cell method; Low temperature deposition; Microcrystalline silicon; Solar cell

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PARAMAGNETIC RESONANCE; RAMAN SCATTERING; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SOLAR CELLS; THIN FILMS;

ELECTRICAL PROPERTIES; HOT WIRE CELL METHOD; LOW-TEMPERATURE DEPOSITION; MICROCRYSTALLINE SILICON;

SILICON;

EID: 3142669214     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2419     Document Type: Article

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