Amorphous silicon thin films prepared by hot wire cell method and its application to solar cells

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 4 A, 2003, Pages 1521-1525

  Ide, Yoshinori ^a   Asakusa, Kouich ^a   Yamada, Akira ^a   Konagai, Makoto ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Amorphous silicon; Hot wire cell method; Low temperature deposition; Solar cell

Indexed keywords

CHEMICAL BONDS; DEPOSITION; FILM PREPARATION; LOW TEMPERATURE EFFECTS; PRESSURE EFFECTS; SECONDARY ION MASS SPECTROMETRY; SOLAR CELLS; THIN FILMS;

HOT WIRE CELL METHOD; MICROCRYSTALLINE SILICON; SUPERSTRATE;

AMORPHOUS SILICON;

EID: 0037531825     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.42.1521     Document Type: Article

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