Effects of high-temperature metal-organic chemical vapor deposition of Pb(Zr,Ti)O3 thin films on structural stabilities of hybrid Pt/IrO2/Ir stack and single-layer Ir bottom electrodes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 5 A, 2004, Pages 2651-2654

  Sun, Ho Jung ^a   Choi, Eun Seok ^a   Lee, Tae Kwon ^a   Hong, Tae Eun ^a   Yang, Jun Mo ^a   Kweon, Soon Yong ^a   Kim, Nam Kyeong ^a   Yeom, Seung Jin ^a   Roh, Jae Sung ^a   Sohn, Hyun Chul ^a   Kim, Jin Woong ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

Ir; MOCVD; Pt; PZT; Structural stability

Indexed keywords

DEFORMATION; ELECTRODES; HIGH TEMPERATURE EFFECTS; METALLIC FILMS; METALLORGANIC CHEMICAL VAPOR DEPOSITION; PEROVSKITE;

BLISTER TYPE DEFORMATION; CAPACITOR STACKS; STRUCTURAL STABILITY;

THIN FILMS;

EID: 3142667000     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.2651     Document Type: Article

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