Design and study of silicone-based materials for bilayer resist application

Journal of Photopolymer Science and Technology

Volumn 17, Issue 4, 2004, Pages 511-518

  Yamada, Shintaro ^a   Cho, Sungseo ^a   Lee, Jai Hyoung ^a,b   Zhang, Tao ^a,c   Zampini, Anthony ^a  

^a ROHM AND HAAS COMPANY   (United States)

^b National Nano Fab Center (NNFC)   (South Korea)

^c Fish & Richardson PC   (United States)

Author keywords

157nm; Bi layer; Silsesquioxane

Indexed keywords

FUNCTIONAL GROUP; HEXAFLUORO 2 PROPANOL; METHYL GROUP; MONOMER; POLYMER; SILICONE; SILSESQUIOXANE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL STRUCTURE; DEPROTECTION REACTION; EXPOSURE; FILM; MATERIALS; THICKNESS;

EID: 3142615900     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.17.511     Document Type: Article

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