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Journal of Photopolymer Science and Technology

Volumn 15, Issue 4, 2002, Pages 559-568

DFT calculations of photoabsorption spectra in the VUV region for design of photoresist materials for 157 nm lithography

(3) Ando, Shinji a Fujigaya, Tsuyohiko a Ueda, Mitsuru a

a TOKYO INSTITUTE OF TECHNOLOGY (Japan)

Author keywords

Photoabsorption spectra; Photoresist materials; Time dependent density functional theory; Transition energy; VUV lithography

Indexed keywords

ORGANIC COMPOUND; POLYMER;

ABSORPTION SPECTROSCOPY; ANALYTIC METHOD; ARTICLE; CALCULATION; DENSITY; ENERGY; GEOMETRY; LITHOGRAPHY; MATERIALS; MATERIALS TESTING; OSCILLATOR; THEORY; VACUUM;

EID: 0036363141 PISSN: 09149244 EISSN: None Source Type: Journal
DOI: 10.2494/photopolymer.15.559 Document Type: Article

Times cited : (28)

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