ArF bi-layer resist for sub-90nm L/S fabrication

Journal of Photopolymer Science and Technology

Volumn 16, Issue 4, 2003, Pages 499-505

  Kim, Hyun Woo ^a   Hong, J ^a   Jung, Myung Ho ^a   Woo, Sang Gyun ^a   Cho, Han Ku ^a   Han, Woo Sung ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

ArF; Bi layer; Dry development

Indexed keywords

SILICON;

ARTICLE; BILAYER MEMBRANE; CHEMICAL PROCEDURES; CHEMICAL STRUCTURE; CROSS LINKING; ELECTRON BEAM; LITHOGRAPHY; PROCESS TECHNOLOGY; STRUCTURE ANALYSIS; THICKNESS;

EID: 0038168567     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.16.499     Document Type: Article

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