Using beam flux monitor as Langmuir probe for plasma-assisted molecular beam epitaxy

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 3, 2005, Pages 460-464

  Wistey, M A ^a   Bank, S R ^a   Yuen, H B ^a   Harris Jr , J S ^a   Oye, M M ^b   Holmes Jr , A L ^b  

^a STANFORD UNIVERSITY   (United States)

^b The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BEAM FLUX MONITOR; FILAMENT WIRES; LAMGMUIR PROBE;

GALLIUM NITRIDE; ION SOURCES; PLASMA APPLICATIONS; REAL TIME SYSTEMS;

MOLECULAR BEAM EPITAXY;

EID: 31044447084     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1881635     Document Type: Article

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