Uniformity study in large-area showerhead reactors

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 927-932

  Sobbia, R ^a   Sansonnens, L ^a   Bondkowski, J ^b  

^a EPFL   (Switzerland)

^b Unaxis Displays   (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; CHEMICAL REACTORS; COMPUTER SOFTWARE; FABRICATION; FINITE VOLUME METHOD; FLAT PANEL DISPLAYS; MATHEMATICAL MODELS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; THIN FILM TRANSISTORS;

MULTIREACTION CHEMISTRY; MULTISPECIES; THREE-DIMENSIONAL GEOMETRY;

THIN FILMS;

EID: 31044431852     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1868613     Document Type: Conference Paper

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