Reactor modeling for radio frequency plasma deposition of SiNxHy: Comparison between two reactor designs

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2071-2082

  Caquineau, H ^a   Dupont, G ^a   Despax, B ^a   Couderc, J P ^b  

^a URA 304 CNRS   (France)

^b LABORATOIRE DE GÉNIE CHIMIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030501203     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.580083     Document Type: Review

References (18)

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