Influence of the reactor design in the case of silicon nitride PECVD

Chemical Engineering Science

Volumn 52, Issue 17, 1997, Pages 2901-2914

  Caquineau, H ^a   Despax, B ^a  

^a Lab Genie Electrique de Toulouse   (France)

Author keywords

Mass transfer; Numerical modeling; PECVD reactor; Reactor design; Reactor sizing; Silicon nitride

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; MASS TRANSFER; PLASMA APPLICATIONS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTOR DESIGN;

SILICON NITRIDE;

EID: 0031238791     PISSN: 00092509     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0009-2509(97)84656-8     Document Type: Article

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