Colloid monolayers as versatile lithographic masks

Langmuir

Volumn 13, Issue 11, 1997, Pages 2983-2987

  Burmeister, Frank ^a   Schäfle, Claudia ^a   Matthes, Thomas ^a   Böhmisch, Matthias ^a   Boneberg, Johannes ^a   Leiderer, Paul ^a  

^a UNIVERSITY OF KONSTANZ   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001599823     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la9621123     Document Type: Article

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