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Volumn 3, Issue 6, 2003, Pages 722-727

Silicon micromechanical structures fabricated by electrochemical process

Author keywords

Hydrogen ion implantation; Microstructures; Porous silicon; Sacrificial layer

Indexed keywords

CMOS INTEGRATED CIRCUITS; ETCHING; INTEGRATED CIRCUITS; ION IMPLANTATION; MAGNETIC FIELDS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; OPTOELECTRONIC DEVICES; POROUS SILICON; RESIDUAL STRESSES; SENSORS; SILICON; THIN FILMS;

EID: 3042702995     PISSN: 1530437X     EISSN: None     Source Type: Journal    
DOI: 10.1109/JSEN.2003.820365     Document Type: Conference Paper
Times cited : (6)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.