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Volumn 60, Issue 1-3, 1997, Pages 235-239

Porous silicon bulk micromachining for thermally isolated membrane formation

Author keywords

Bulk micromachining; Membranes; Porous silicon

Indexed keywords

CHEMICAL SENSORS; CHEMICAL VAPOR DEPOSITION; CRYSTALLINE MATERIALS; MEMBRANES; NITRIDES; POROUS SILICON; POTASSIUM COMPOUNDS; SINGLE CRYSTALS; SUBSTRATES;

EID: 0031144956     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01384-8     Document Type: Article
Times cited : (65)

References (5)
  • 1
    • 0025401835 scopus 로고
    • A substrate for thin-film gas sensors in microelectronic technology
    • U. Dibbern, A substrate for thin-film gas sensors in microelectronic technology, Sensors and Actuators B, 2 (1990) 63-70.
    • (1990) Sensors and Actuators B , vol.2 , pp. 63-70
    • Dibbern, U.1
  • 2
    • 0019530139 scopus 로고
    • A new dielectric isolation method using porous silicon
    • K. Imai, A new dielectric isolation method using porous silicon, Solid-State Electronics, 24 (1981) 159-164.
    • (1981) Solid-State Electronics , vol.24 , pp. 159-164
    • Imai, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.