Frontside micromachining using porous-silicon sacrificial-layer technologies

Sensors and Actuators, A: Physical

Volumn 60, Issue 1-3, 1997, Pages 228-234

  Bischoff, Thomas ^a   Müller, Gerhard ^a,c   Welser, Wolfgang ^a,c   Koch, Frederik ^b  

^a DAIMLER AG   (Germany)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c AIRBUS GROUP INNOVATIONS   (Germany)

Author keywords

Frontside micromachinmg; Porous silicon; Sacrificial layer technology

Indexed keywords

CRYSTALLINE MATERIALS; DOPING (ADDITIVES); ION IMPLANTATION; MICROSTRUCTURE; POROUS SILICON; POTASSIUM COMPOUNDS;

FRONTSIDE MICROMACHINING; SACRIFICIAL LAYER TECHNOLOGY;

MICROMACHINING;

EID: 0031141921     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01383-6     Document Type: Article

References (11)

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