New silicon micromachining techniques for microsystems

Sensors and Actuators, A: Physical

Volumn 62, Issue 1-3, 1997, Pages 652-662

  French, P J ^a   Gennissen, P T J ^a   Sarro, P M ^a  

^a DELFT UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Epi micromachining; Micromachining; Microstructures; Silicon

Indexed keywords

ETCHING; MICROELECTRONICS; SILICON WAFERS;

EPI MICROMACHINING;

MICROMACHINING;

EID: 0031176398     PISSN: 09244247     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0924-4247(97)01502-1     Document Type: Article

References (29)

1. K.E. Bean, Anisotropic etching of silicon, IEEE Trans. Electron Devices, ED-25 (1978) 1185-1193.
2. K. Ohwada, Y. Negoro, Y. Konaka and T. Oguchi, Groove depth uniformization in (110) Si anisotropic etching by ultrasonic wave and application to accelerometer fabrication, Proc. MEMS '95, Amsterdam, The Netherlands, 29 Jan.-2 Feb. 1995, pp. 100-105.
3. H. Seidel, L. Csepregi, A. Heuberger and H. Baumgärtel, Anisotropic etching of crystalline silicon in alkaline solution; Part I orientation dependence and behavior of passivation layers; Part II influence of dopants, J. Electrochem. Soc., 137 (1990) 3612-3626.
4. A. Merlos, M. Acero, M.H. Bao, J. Bausells and J. Esteve, TMAH/ IPA anisotropic etching characteristics, Sensors and Actuators A, 37-38 (1993) 737-743.
5. E.W. Becker, W. Ehrfeld, P. Hagmann, A. Maner and D. Munchmeyer, Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming and plastic moulding (LIGA process), Microelectronic Eng., 4 (1986) 35.
6. K.M. Mahmoud and R.F. Wolffenbuttel, Compatibility between bipolar read-out electronics and microstructures in silicon, Sensors and Actuators A, 31 (1992) 188-199.
7. H. Guckel, J.J. Sniegowski, T.R. Christenson, S. Mohney and T.F. Kelly, Fabrication of micromechanical devices from polysilicon films with smooth surfaces, Sensors and Actuators, 20 (1990) 117-122.
8. P.J. French, B.P. van Drieënhuizen, D. Poenar, J.F.L. Goosen, R. Mallée, P.M. Sarro and R.F. Wolffenbuttel, The development of a low stress polysilicon process compatible with standard device processing, IEEE J. MEMS, 5 (1996) 187-196.
9. V.P. Jaecklin, C. Linder, N.F. de Rooij, J.-M. Moret and R. Vuilleumier, Line-addressable torsional micromirrors for light modulator arrays, Sensors and Actuators A, 41-42 (1994) 324-329.
10. G.M. O'Halloran, M. Kuhl, P.M. Sarro, P.T.J. Gennissen and P.J. French, New etchant for the fabrication of porous silicon, Proc. Electrochem. Soc. Spring Meet., Los Angeles, CA, USA, 5-10 May, 1996, p. 414.
11. P.J. French, Development of surface micromachining techniques compatible with on-chip electronics, J. Micromech. Microeng., 6 (1996) 197-211.
12. K.A. Shaw, Z.L. Zhang and N.C. MacDonald, SCREAM I: a single mask, single-crystal silicon, reactive ion etching process for microelectromechanical structures, Sensors and Actuators A, 40 (1994) 63-70.
13. Z.L. Zhang and N.C. MacDonald, A RIE process for submicron, silicon electromechancial structures, J. Micromech. Microeng., 2 (1992) 31-38.
14. K.A. Shaw and N.C. MacDonald, Integrating SCREAM micromachined devices with integrated circuits, Proc. IEEE MEMS, San Diego, CA, USA, 11-15 Feb., 1996, pp. 44-48.
15. Y.X. Li, P.J. French, P.M Sarro and R.F. Wolffenbuttel, Fabrication of a single crystalline silicon capacitive lateral accelerometer using micromachining based on single step plasma etching, Proc. MEMS '95, Amsterdam, The Netherlands, 29 Jan.-2 Feb., 1995, pp. 398-403.
16. B. Diem, P. Rey, S. Renard, S. Viollet Bosson, H. Bono, F. Michel, M.T. Delaye and G. Delapierre, SOI SIMOX from bulk to surface micromachining, a new age for silicon sensors and actuators, Sensors and Actuators A, 46-47 (1995) 8-16.
17. M. de Boer, H. Jansen and M. Elwenspoek, The black silicon method V: A study of the fabricating of moveable structures for micro electromechanical systems, Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/Eurosensors IX), Stockholm, Sweden, 25-29 June, 1995, pp. 565-568.
18. M. Bartek, P.T.J. Gennissen, P.M. Sarro, P.J. French and R.F. Wolffenbuttel, An integrated silicon colour sensor using SEG techniques, Sensors and Actuators A, 41-42 (1994) 123-128.
19. G.W. Neudeck and A.E. Kabir, Single crystal silicon beams formed by merged epitaxial lateral overgrowth (MELO) for optical reflectors, SPIE Proc., Vol. 2383, Micro Optics Micromech. Laser Scanning and Shaping, San Jose, CA, USA, 7-9 Feb., 1995, pp. 146-153.
20. M. Bartek, P.T.J. Gennissen, P.J. French and R.F. Wolffenbuttel, Confined selective epitaxial growth: potential for smart sensor applications, Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/Eurosensors IX), Stockholm, Sweden, 25-29 June, 1995, pp. 91-94.
21. P. Steiner, A. Richter and W. Lang, Using porous silicon as a sacrificial layer, J. Micromech. Microeng., 3 (1993) 32-36.
22. P.T.J. Gennissen, P.J. French, D.P.A. De Munter, T.E. Bell, H. Kaneko and P.M. Sarro, Porous silicon micromachining techniques for acceleration fabrication, Proc. ESSDERC '95, Den Haag, The Netherlands, Sept. 1995, pp. 593-596.
23. C.J.M. Eijkel, J. Branebjerg, M. Elwenspoek and F.C.M. van de Pol, A new technology for micromachining of silicon: dopant selective HF anodic etching for the realisation of low-doped monocrystalline silicon structures, IEEE Electron Device Lett., 11 (1990) 588-589.
24. P. Steiner and W. Lang, Micromachining applications of porous silicon, Thin Solid Films, 225 (1995) 52-58.
25. M. Kirsten, B. Wenk, F. Ericson, J.Å. Schweitz, W. Riethmüller and P. Lange, Deposition of thick doped polysilicon films with low stress in an epitaxial reactor for surface micromachining applications, Thin Solid Films, 259 (1995) 181-187.
26. T. Lisec, M. Kreutzer and B. Wagner, A surface micromachined piezoresistive pressure sensor with high sensitivity, Proc. ESSDERC '95, Den Haag, The Netherlands, Sept. 1995, pp. 339-342.
27. M. Offenberg, F. Lärmer, B. Elsner, H. Münzel and W. Riethmüller, Novel process for a monolithic integrated accelerometer, Tech. Digest, 8th Int. Conf. Solid-State Sensors and Actuators (Transducers '95/ Eurosensors IX), Stockholm, Sweden, 25-29 June, 1995, pp. 589-592.
28. P.T.J. Gennissen, M. Bartek, P.J. French and P.M. Sarro, Thick polysilicon microstructures by combination of epitaxial and poly growth in a single deposition step, Proc. Nat. Sensor Conf., Delft, The Netherlands, 20-21 March, 1996, pp. 189-192.
29. P.T.J. Gennissen, M. Bartek, P.J. French and P.M. Sarro, Bipolar compatible epitaxial poly for smart sensors: stress minimisation and applications, Sensors and Actuators A, this volume.