Effect of Al additions and AlN interlayers on the stabilization of cBN sputtered thin films

Diamond and Related Materials

Volumn 13, Issue 9, 2004, Pages 1690-1696

  Otano Rivera, Wilfredo ^a   Messier, Russell ^b   Pilione, Lawrence J ^b   Santiago, Jorge J ^c   Lamaze, George ^d  

^a UNIVERSITY OF PUERTO RICO AT CAYEY   (Puerto Rico)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

^c UNIVERSITY OF PENNSYLVANIA   (United States)

^d NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Cubic boron nitride (c BN); Ion bombardment; Nucleation; Sputtering

Indexed keywords

BORON COMPOUNDS; MAGNETRON SPUTTERING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SILICON; SUBSTRATES; THIN FILMS;

CUBIC BORON NITRIDE (CBN); DEPTH PROFILING;

ALUMINUM NITRIDE;

ALUMINUM; ALUMINUM NITRIDE; BORON NITRIDE; NUCLEATION; SPUTTERING;

EID: 3042604599     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.02.005     Document Type: Article

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