Depth profiles of Argon incorporated in Boron Nitride films during preparation and their temperature dependent evolution

Diamond and Related Materials

Volumn 12, Issue 1, 2003, Pages 37-46

  Deyneka, N ^a   Zhang, X W ^a   Boyen, H G ^a   Ziemann, P ^a   Fukarek, W ^b   Kruse, O ^b   Moller W ^b  

^a UNIVERSITY OF ULM   (Germany)

^b INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

Boron Nitride; Diffusion; Ion assisted deposition; Rutherford backscattering

Indexed keywords

ARGON; CUBIC BORON NITRIDE; DIFFUSION; GRAIN BOUNDARIES; ION BEAM ASSISTED DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY;

GRAIN BOUNDARY DIFFUSION;

THIN FILMS;

DIAMOND;

EID: 0037217720     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(02)00247-9     Document Type: Article

References (33)

1. J. Robertson, Diam. Relat. Mater. 5 (1996) 519.
2. S. Ulrich, J. Schwan, W. Denner, H. Ehrhard, Diam. Relat. Mater. 5 (1996) 548.
3. H. Hofsaess, C. Ronning, U. Griesmeier, M. Gross, S. Reinke, M. Kuhr, Appl. Phys. Lett. 67 (1995) 46.
4. P. Ziemann, H.-G. Boyen, N. Deyneka, D. Schwertberger, P. Widmayer, Adv. Solid State Phys. 40 (2000) 424.
5. M.B.E. Mekki, M.A. Djouadi, V. Mortet, E. Guiot, N. Mestres, Thin Solid Films 355-356 (1999) 89.
6. W. Fukarek, C. Fitz, A. Kolitsch, W. Möller, Mater. Sci. Forum 437-439 (2000) 256.
7. J. Tian, L. Xia, X. Ma, et al., Thin Solid Films 355-356 (1999) 229.
8. H. Wituschek, H. Stopka-Ebler, G.K. Wolf, Surf. Coat. Technol. 74 (1995) 1.
9. A. Lunk, P. Bachem, P. Scheible, L. Ulrich, Appl. Phys. A 72 (2001) 557.
10. W. Kulisch, Deposition of Superhard Diamond-like Materials, Springer, Heidelberg, Berlin, 1999.
11. H.-G. Boyen, N. Deyneka, P. Ziemann, F. Banhart, Diam. Relat. Mater. 11 (2002) 38.
12. D.J. Kester, A.K.S. Ailey, D.J. Lichtenwalner, R.F. Davis, J. Vac. Sci. Technol. A 12 (1994) 3074.
13. T. Ahlgren, E. Vainonen, J. Likonen, J. Keinonen, Phys. Rev. B 57 (1998) 9723.
14. D. Narducci, J.J. Cuomo, J. Appl. Phys. 68 (1990) 1184.
15. R.M. Chrenko, R.E. Tuft, H.M. Strong, Nature 270 (1977) 141.
16. G. Popovici, R.G. Wilson, T. Sung, M.A. Prelas, S. Khasawinah, J. Appl. Phys. 77 (1995) 5103.
17. D.R. McKenzie, J. Vac. Sci. Technol. B 11 (1993) 1928.
18. S. Reinke, M. Kuhr, W. Kulisch, Diam. Relat. Mater. 5 (1996) 508.
19. C. Ronning, E. Dreher, H. Feldermann, M. Gross, M. Sebastian, H. Hofsäss, Diam. Relat. Mater. 6 (1997) 1129.
20. P. Widmayer, P. Ziemann, H.-G. Boyen, Diam. Relat. Mater. 7 (1998) 385.
21. P. Widmayer, H.-G. Boyen, P. Ziemann, P. Reinke, P. Oelhafen, Phys. Rev. B 59 (1999) 5233.
22. C. Fitz, A. Kolitsch, W. Fukarek, Thin Solid Films 389 (2001) 173.
23. J. Ullmann, A.J. Kellock, A.E.E. Baglin, Thin Solid Films 341 (1999) 238.
24. S. Fahy, Phys. Rev. B 51 (1995) 12873.
25. I.R. Doolittle, Nucl. Instrum. Methods B 9 (1985) 344.
26. Q. Li, L.D. Marks, Y. Lifshitz, S.T. Lee, I. Bello, Phys. Rev. B 65 (2002 045415.
27. D.L. Medlin, T.A. Friedmann, P.B. Mirkarimi, G.F. Cardinale, K.F. McCarty, J. Appl. Phys. 79 (1996) 3567.
28. H. Hofsäss, C. Ronning, U. Griesmeier, et al., Nucl. Instrum. Methods B 110 (1995) 153.
29. M.F. Plass, W. Fukarek, A. Kolitsch, N. Schnell, W. Möller, Thin Solid Films 305 (1997) 172.
30. L. Tian, M.O. Thompson, R. Dieckmann, J. Appl. Phys. 90 (2001) 3799.
31. G.N.A.V. Veen, F.H.M. Sanders, J. Dieleman, A.V. Veen, D.J. Oostra, A.E.D. Vries, Phys. Rev. Lett. 57 (1986) 739.
32. J. Crank (Ed.), The Mathematics of Diffusion, second ed., Clarendon Press, Oxford, 1975.
33. T. Sung, G. Popopvici, M.-A. Prelas, R.G. Wilson, Diamond for Electronic Applications, Pittsburgh, 1996 (Mater. Res. Soc.), pp. 467.