Spin-on-glass thin films prepared from a novel polysilsesquioxane by thermal and ultraviolet-irradiation methods

Thin Solid Films

Volumn 345, Issue 2, 1999, Pages 244-254

  Pan, Qi ^a   Gonzalez, Gabriela B ^a   Composto, Russell J ^a   Wallace, William E ^b   Arkles, Barry ^c   Figge, Lisa K ^a   Berry, Donald H ^a  

^a UNIVERSITY OF PENNSYLVANIA   (United States)

^b NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^c Gelest Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ELECTRON MICROSCOPY; ELLIPSOMETRY; FILM PREPARATION; GLASS; MORPHOLOGY; PHOTOLYSIS; PYROLYSIS; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; ULTRAVIOLET RADIATION;

FORWARD RECOIL SPECTROMETRY; SPIN-ON-GLASS THIN FILMS; X RAY REFLECTIVITY;

DIELECTRIC FILMS;

EID: 0032629942     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01740-4     Document Type: Article

References (31)

1. Rao G.K. Multilevel Interconnect Technology. 1993;McGraw-Hill, New York.
2. Lee W.W., Ho P.S. MRS Bulletin. 22:(10):1997;19.
3. Handbook of Multilevel Metallization for Integrated Circuits. Wilson S.R., Tracy C.J., Freeman J.L. Jr. Materials, Technology, and Applications. 1993;Noyes Publications, Park Ridge, NJ.
4. Lu T.-M., Moore J.A. MRS Bulletin. 22:(10):1997;28.
5. Pliskin W.A. J. Vac. Sci. Technol. 14:1977;1064.
6. Kim J.-H., Seo S.-H., Yun S.-M., Chang H.-Y., Lee K.-M., Choi C.-K. Appl. Phys. Lett. 68:1996;1507.
7. Seyferth D. Adv. Chem. Ser. 224:1990;565.
8. Baney R.H., Itoh M., Sakakibara A., Suzuki T. Chem. Rev. 95:1995;1409.
9. Hacker N.P. MRS Bulletin. 22:(10):1997;33.
10. Schmidt H.K. Zeldon M., Wynne K.J., Allcock H.R. ACS Symposium Series 360. 1988;American Chemical Society, Washington DC.
11. Arkles B., Berry D.H., Figge L.H., Composto R.J., Chiou T., Colazzo H., Wallace W.E. J. Sol-Gel Sci. Tech. 8:1997;465.
12. Lisa Kiernan Figge, Ph.D. Dissertation, University of Pennsylvania, 1996.
13. Doolittle L.R. Nucl. Instr. Methods. B9:1985;344.
14. Doolittle L.R. Nucl. Instr. Methods. B15:1986;227.
15. Leavitt J.A., McIntyre L.C. Jr., Stoss P., Oder J.G., Ashbaugh M.D., Dezfouly-Arjomandy B., Yang Z.M., Lin Z. Nucl. Instr. Methods. B40/41:1989;776.
16. Genzer J., Rothman J.B., Composto R.J. Nucl. Instr. Methods. B86:1994;345.
17. Li J., Moghadam F., Matienzo L.J., Alford T.L., Mayer J.W. Solid State Technol. 38:(5):1995;61.
18. Chu W.-K., Mayer J.W., Nicolet M.-A. Backscattering Spectrometry. 1978;Academic Press, Orlando.
19. Wallace W.E., Wu W.L. Appl. Phys. Lett. 67:1995;1203.
20. Leavitt J.A., McIntyre L.C. Jr., Ashbaugh M.D., Oder J.G., Lin Z., Dezfouly-Arjomandy B. Nucl. Instr. Methods. B44:1990;260.
21. Rodriguez F. Principles of Polymer Systems. 2nd Ed. 1982;McGraw-Hill, New York.
22. Pliskin W.A., Lehman H.S. J. Electrochem. Soc. 112:1965;1013.
23. Gentle T.E. Proc. SPIE. 1595:1991;146.
24. Mirley C.L., Koberstein J.T. Langmuir. 11:1995;1049.
25. Klumpp A., Sigmund H. Appl. Surf. Sci. 43:1989;301.
26. Pliskin W.A., Lehman H.S. J. Electrochem. Soc. 112:1965;1013.
27. Schenker R.E., Oldham W.G. J. Appl. Phys. 82:1997;1065.
28. J. Sharma, D.H. Berry, R.J. Composto, H.L. Dai, J. Mater. Res., (in press).
29. Joubert O., Hollinger G., Fiori C., Devine R.A.B., Paniez P., Pantel R. J. Appl. Phys. 69:1991;6647.
30. Nastasi M., Tesmer J.R. Handbook of Modern Ion Beam Materials Analysis. 1995;Materials Research Society, Pittsburgh, PA.
31. Hacker N.P., Davies G., Figge L., Krajewski T., Lefferts S., Nedbal J., Spear R. Mater. Res. Soc. Symp. Proc. 476:1997;25.