Physical vapor deposition on cylindrical substrates

Surface and Coatings Technology

Volumn 185, Issue 2-3, 2004, Pages 283-291

  Hass, D D ^a   Marciano, Y ^b   Wadley, H N G ^a  

^a University of Virginia   (United States)

^b NUCLEAR RESEARCH CENTER NEGEV   (Israel)

Author keywords

Aluminum; Electron beam evaporation; Thickness uniformity models

Indexed keywords

COATINGS; EVAPORATION; MONTE CARLO METHODS; PRESSURE EFFECTS; SPUTTERING; SUBSTRATES;

COLLISIONLESS VAPOR TRANSPORT; LINE-OF-SIGHT DEPOSITION; LOW PRESSURE PHYSICAL VAPOR COATINGS;

PHYSICAL VAPOR DEPOSITION;

ALUMINUM; COATING; CYLINDER; VAPOR DEPOSITION;

EID: 3042601544     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.12.027     Document Type: Article

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