Improved design of inverted magnetrons used for deposition of thin films on wires

Surface and Coatings Technology

Volumn 90, Issue 3, 1997, Pages 268-274

  Kaneko, Tadao ^a   Nittono, Osamu ^b  

^a GUNMA NATIONAL COLLEGE OF TECHNOLOGY   (Japan)

^b TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Deposition; Inverted magnetrons; Thin films; Wires

Indexed keywords

ADHESION; ELECTRODES; ION BOMBARDMENT; MICROSTRUCTURE; MORPHOLOGY; SCANNING ELECTRON MICROSCOPY; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; TITANIUM; WIRE;

CYLINDRICAL MAGNETRON SPUTTERING; INVERTED MAGNETRONS;

MAGNETRON SPUTTERING;

EID: 0031118086     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(96)03151-9     Document Type: Article

References (8)

1. W.D. Gill and E. Kay, Rev. Sci. Instrum., 36 (1965) 277.
2. R.R. Kieschke, R.E. Somekh and T.W. Clyne, Acta Metall. Mater., 39 (1991) 427.
3. I.G. Petrov, J.S. Koutev and V.I. Orlinov, Bulg. J. Phys., 13 (1986) 273.
4. J.A. Thornton, Z. Metallkde. Bd 75 (1984) H.11.847.
5. Z. Xu, B.H. Fang, W.N. Zheng, C.Z. Wang and B. Tang, Surf. Coat. Technol., 43/44 (1990) 1065.
6. R.D. Bland, G.J. Kominiak and D.M. Mattox, J. Vac. Sci. Technol., 11 (1974) 671.
7. W.D. Sproul, P.J. Rudnik, M.E. Graham and S.L. Rohde, Surf. Coat. Technol., 43/44 (1990) 270.
8. J.A. Thornton, in Deposition Technologies for films and Coatings, Noyes Publications, New Jersey, 1982, Ch. 5, p. 201.