Transition from amorphous to crystalline beta phase in co-sputtered Fe Si2 films as a function of temperature

Journal of Applied Physics

Volumn 98, Issue 12, 2005, Pages

  Milosavljevic M ^a,b   Shao, G ^c   Loureno M A ^a   Gwilliam, R M ^a   Homewood, K P ^a   Edwards, S P ^a   Valizadeh, R ^d   Colligon, J S ^d  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b UNIVERSITY OF BELGRADE   (Serbia)

^c BRUNEL UNIVERSITY   (United Kingdom)

^d MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; CRYSTALLINE MATERIALS; IRON; SEMICONDUCTOR MATERIALS; STOICHIOMETRY; SUBSTRATES;

ANNEALING TEMPERATURE; BULK DIFFUSION; CRYSTALLINE PHASE; POSTDEPOSITION TREATMENTS;

TRANSITION METAL ALLOYS;

EID: 29744468610     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2148629     Document Type: Review

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