Nanoimprint pattern transfer quality from specular x-ray reflectivity

Applied Physics Letters

Volumn 87, Issue 26, 2005, Pages 1-3

  Lee, Hae Jeong ^a   Soles, Christopher L ^a   Ro, Hyun Wook ^a   Jones, Ronald L ^a   Lin, Eric K ^a   Wu, Wen Li ^a   Hines, Daniel R ^b  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b LABORATORY FOR PHYSICAL SCIENCES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LINEWIDTH VARIATIONS; NANOIMPRINT LITHOGRAPHY; PATTERN TRANSFER; SPECULAR X-RAY REFLECTIVITY;

ELECTRONIC PROPERTIES; LIGHT REFLECTION; LITHOGRAPHY; MEASUREMENTS; NANOTECHNOLOGY;

X RAY ANALYSIS;

EID: 29744457940     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2158512     Document Type: Article

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