-
1
-
-
0034822557
-
Implementation of high-side high-voltage RESURF LDMOS in a sub-half micrometer smart-power technology
-
R. Zhu, V. Parthasarathy, V. Khemka, A. Bose, and T. Roggenbauer, "Implementation of high-side high-voltage RESURF LDMOS in a sub-half micrometer smart-power technology," in Proc. Int. Symp. Power Semicond. Dev. ICs, 2001, pp. 403-406.
-
Proc. Int. Symp. Power Semicond. Dev. ICs, 2001
, pp. 403-406
-
-
Zhu, R.1
Parthasarathy, V.2
Khemka, V.3
Bose, A.4
Roggenbauer, T.5
-
2
-
-
0034454162
-
SOA improvement by a double RESURF LDMOS technique in a power IC technology
-
V. Parthasarathy, V. Khemka, R. Zhu, and A. Bose, "SOA improvement by a double RESURF LDMOS technique in a power IC technology," in IEDM Tech. Dig., 2000, pp. 75-78.
-
IEDM Tech. Dig., 2000
, pp. 75-78
-
-
Parthasarathy, V.1
Khemka, V.2
Zhu, R.3
Bose, A.4
-
3
-
-
0034449133
-
2 RESURF LDMOS in a 0.35 μm CMOS process
-
2 RESURF LDMOS in a 0.35 μm CMOS process," in Proc. Int. Symp. Power Semicond. Dev. ICs, 2000, pp. 335-338.
-
Proc. Int. Symp. Power Semicond. Dev. ICs, 2000
, pp. 335-338
-
-
Zhu, R.1
Parthasarathy, V.2
Bose, A.3
Baird, R.4
Khemka, V.5
Roggenbauer, T.6
Collins, D.7
Chang, S.8
Hui, P.9
Ger, M.L.10
Zunino, M.11
-
4
-
-
0034447764
-
A 0.35 μm, CMOS based smart-power technology for 7 V-50 V applications
-
V. Parthasarathy, R. Zhu, M. L. Ger, V. Khemka, A. Bose, R. Baird, T. Roggenbauer, D. Collins, S. Chang, P. Hui, and M. Zunino, "A 0.35 μm, CMOS based smart-power technology for 7 V-50 V applications," in Proc. Int. Symp. Power Semicond. Dev. ICs, 2000, pp. 317-320.
-
Proc. Int. Symp. Power Semicond. Dev. ICs, 2000
, pp. 317-320
-
-
Parthasarathy, V.1
Zhu, R.2
Ger, M.L.3
Khemka, V.4
Bose, A.5
Baird, R.6
Roggenbauer, T.7
Collins, D.8
Chang, S.9
Hui, P.10
Zunino, M.11
-
5
-
-
0034448282
-
LDMOS implementation in a 0.35 μm BCD technology (BCD6)
-
A. Moscatelli, A. Merlini, G. Croce, P. Galbiati, and C. Contiero, "LDMOS implementation in a 0.35 μm BCD technology (BCD6)," in Proc. Int. Symp. Power Semicond. Dev. ICs, 2000, pp. 323-326.
-
Proc. Int. Symp. Power Semicond. Dev. ICs, 2000
, pp. 323-326
-
-
Moscatelli, A.1
Merlini, A.2
Croce, G.3
Galbiati, P.4
Contiero, C.5
-
7
-
-
0034826465
-
0.6 μm BiCMOS based 15 and 25 V LDMOS for analog applications
-
Y. Kawaguchi, K. Nakamura, K. Karouji, K. Watanabe, Y. Yamaguchi, and A. Najagawa, "0.6 μm BiCMOS based 15 and 25 V LDMOS for analog applications," in Proc. Int. Symp. Power Semicond. Dev. ICs, 2001, pp. 169-172.
-
Proc. Int. Symp. Power Semicond. Dev. ICs, 2001
, pp. 169-172
-
-
Kawaguchi, Y.1
Nakamura, K.2
Karouji, K.3
Watanabe, K.4
Yamaguchi, Y.5
Najagawa, A.6
-
8
-
-
2942635282
-
A 0.25 μm smart-power technology optimized for wireless applications
-
R. Zhu, V. Parthasarathy, V. Khemka, A. Bose, T. Roggenbauer, P. Hui, M. Butner, B. Baumert, and D. Collins, "A 0.25 μm smart-power technology optimized for wireless applications," in Proc. Int. Symp. Power Semicond. Dev. ICs, 2003, pp. 169-172.
-
Proc. Int. Symp. Power Semicond. Dev. ICs, 2003
, pp. 169-172
-
-
Zhu, R.1
Parthasarathy, V.2
Khemka, V.3
Bose, A.4
Roggenbauer, T.5
Hui, P.6
Butner, M.7
Baumert, B.8
Collins, D.9
-
9
-
-
0036610921
-
Experimental and theoretical analysis of energy capability of RESURF LDMOSFETs and its correlation with statis electrical safe operating area (SOA)
-
June
-
V. Khemka, V. Parthasarathy, R. Zhu, A. Bose, and T. Roggenbauer, "Experimental and theoretical analysis of energy capability of RESURF LDMOSFETs and its correlation with statis electrical safe operating area (SOA)," IEEE Trans. Electron Devices, vol. 49, pp. 1049-1058, June 2002.
-
(2002)
IEEE Trans. Electron Devices
, vol.49
, pp. 1049-1058
-
-
Khemka, V.1
Parthasarathy, V.2
Zhu, R.3
Bose, A.4
Roggenbauer, T.5
-
10
-
-
0036923560
-
A 0.25 μm CMOS based smart-power technology with deep trench for high-voltage isolation
-
V. Parthasarathy, R. Zhu, V. Khemka, T. Roggenbauer, A. Bose, P. Hui, P. Rodriguez, J. Nivison, D. Collins, Z. Wu, I. Puchades, and M. Butner, "A 0.25 μm CMOS based smart-power technology with deep trench for high-voltage isolation," in IEDM Tech. Dig., 2002, pp. 459-462.
-
IEDM Tech. Dig., 2002
, pp. 459-462
-
-
Parthasarathy, V.1
Zhu, R.2
Khemka, V.3
Roggenbauer, T.4
Bose, A.5
Hui, P.6
Rodriguez, P.7
Nivison, J.8
Collins, D.9
Wu, Z.10
Puchades, I.11
Butner, M.12
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