Temperature dependence of a-C:H film deposition in a CH4 radio frequency plasma

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 14, Issue 4, 1996, Pages 2666-2668

  Mutsukura, Nobuki ^a   Saitoh, Kazuhiko ^a  

^a TOKYO DENKI UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0030491620     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.579999     Document Type: Article

References (14)

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